Transparent and conducting ZnO films prepared by reactive pulsed laser deposition |
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| Authors: | Raid A. Ismail Bassam G. Rasheed Evan T. Salm Mukram Al-Hadethy |
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| Affiliation: | (1) University of Technology, Baghdad, Iraq;(2) Present address: Faculty of Education, Haduramout university, Al-Jabri, Seiyun, 00967, Yemen |
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| Abstract: | Undoped ZnO films were prepared on glass substrates without any post-deposition heat treatment using a pulsed Nd:YAG laser ablation of Zn target in the presence of oxygen as reactive atmosphere. Structural, optical, and electrical properties of these films have been investigated as functions of oxygen pressure during deposition. Transparent conducting ZnO films, formed at 120 torr of oxygen pressure, showed an electrical resistivity of 0.27 Ωcm, a mean optical transmittance of 80%, and an optical band gap of 3.25 eV. |
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