一种用于CTCP技术的新型脉冲等离子体光源

继续沿用传统PS版的计算机直接制版技术(CTCP)对于我国的印刷包装行业具有特殊重要的意义。亟待解决的问题是实现光源对PS版的脉冲式曝光。本文报道了一套采用正弦脉冲高频电源激励的新型氮气等离子体光源,首次获得了光源的准脉冲输出,并成功的对一种超感度PS版进行了曝光。光谱分析表明氮气等离子体光源的光谱结构较碘镓灯更适于传统PS版曝光。进一步从电源电压、工作气压等方面探讨了光源的最佳运行参数,随着电源功率的增大和光源结构参数的优化,可望得到更大的光输出功率。本文对实现CTCP技术的脉冲式曝光具有一定的参考价值。

A Novel Pulse Plasma Light Source for CTCP Technology in Printing Industry

It is very important to popularize the Computer to Plate technology CPT using the conventional pre-sensitized plate in our printing and packaging industry.The most urgent problem is to find a novel light source for the conventional PS plate pulsed-type exposure.A novel pulse plasma light source stimulated by a pulsed sinusoidal high frequency supply is reported,and a commercial PS plate is successfully exposed.The spectrum analysis shows the lamp we developed is more suitable for PS plate exposure than that widely used iodine gallium lamp.And further the optimum parameters of our light source is explored from the power voltage and gas pressure.With the increasing of power supply and the parameters optimization of the lamp,a higher optical output power density will be obtained.Our results lead the CTCP technology to a new stage by using a pulsed exposure working mode.