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Temperature dependent interfacial and electrical characteristics during atomic layer deposition and annealing of HfO2 films in p-GaAs metal-oxide-semiconductor capacitors |
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| Authors: | Liu Chen Zhang Yuming Zhang Yimen L&#; Hongliang and Lu Bin |
| Affiliation: | School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China |
| Abstract: | |
| Keywords: | GaAs metal-oxide-semiconductor capacitor temperature interface leakage current |
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