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Study of metamorphic InGaAs/GaAs quantum well laser materials grown on GaAs substrate by molecular beam epitaxy
Authors:ZHU Yan  NI Hai-qiao  WANG Hai-li  HE Ji-fang  LI Mi-feng  SHANG Xiang-jun  NIU Zhi-chuan
Affiliation:ZHU Yan,NI Hai-qiao,WANG Hai-li,HE Ji-fang,LI Mi-feng,SHANG Xiang-jun,and NIU Zhi-chuan State Key Laboratory for Superlattices and Microstructures,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Abstract:The GaAs based InGaAs metamorphic structures and their growth by molecular beam epitaxy (MBE) are investigated. The controlling of the source temperature is improved to realize the linearly graded InGaAs metamorphic structure precisely. The threading dislocations are reduced. We also optimize the growth and annealing parameters of the InGaAs quantum well (QW). The 1.3-μm GaAs based metamorphic InGaAs QW is completed. A 1.3-μm GaAs based metamorphic laser is reported.
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