首页 | 本学科首页   官方微博 | 高级检索  
     


Optimizing adsorption of arsenic(III) by NH2-MCM-41 using response surface methodology
Affiliation:1. Key Laboratory of Integrated Regulation and Resources Development of Shallow Lakes, Ministry of Education, Hohai University, Nanjing 210098, China;2. College of Environment, Hohai University, Nanjing 210098, China;1. State Key Laboratory of Pollution Control and Resource Reuse, School of the Environment, Nanjing University, Nanjing 210023, PR China;2. National Engineering Research Center for Organic Pollution Control and Resources Reuse, Nanjing 210023, PR China;3. Collaborative Innovation Center of Advanced Technology and Equipment for Water Pollution Control, Nanjing 210023, PR China;4. Nanjing University & Yancheng Academy of Environmental Protection Technology and Engineering, Yancheng 210009, PR China;1. Key Laboratory for Green Chemical Technology, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China;2. Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China;3. Tianjin Key Laboratory of Membrane Science and Desalination Technology, Tianjin University, Tianjin 300072, China;4. Key Laboratory for Green Process of Chemical Engineering of Xinjiang Bingtuan, School of Chemistry and Chemical Engineering, Shihezi University, Xinjiang, Shihezi 832003, China
Abstract:Response surface methodology (RSM) was used to optimize process parameters for arsenic (As(III)) removal from aqueous solution using amine-functionalized MCM-41 (NH2-MCM-41). Four independent variables such as pH, initial metal concentration, temperature and adsorbent dosage were investigated. The optimal conditions to remove As(III) by NH2-MCM-41 was found to be pH 5.62, initial As(III) concentration 5.00 mg/L, temperature 20 °C and NH2-MCM-41 dosage 5.00 g/L. XRD, FTIR and SEM analyses testified to the obvious change of the surface morphology and the presence of metal on the sorbent after adsorption.
Keywords:Adsorption  As(III)  Response surface methodology
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号