Preparation of copper containing methacrylic polymers and their application for the copper patterns |
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| Affiliation: | 1. Department of Chemical Engineering, Kyonggi University, Suwon 443-760, Republic of Korea;2. Department of Chemical and Biological Engineering, Institute of Chemical Process, Seoul National University, Seoul 151-744, Republic of Korea;1. Interdisciplinary Center for Molecular Materials (ICMM) and Computer-Chemistry-Center (CCC), Friedrich-Alexander-University Erlangen-Nürnberg, Nägelsbachstr. 25, 91052 Erlangen, Germany;2. Institute of Chemistry, University of Bialystok, Hurtowa 1, 15-399 Bialystok, Poland;1. Key Laboratory of Superlight Material and Surface Technology, Ministry of Education, College of Material Science and Chemical Engineering, Harbin Engineering University, Harbin 150001, Heilongjiang, China;2. Key Laboratory for Photonic and Electronic Bandgap Materials, Ministry of Education; College of Chemistry and Chemical Engineering, Harbin Normal University, Harbin 150025, Heilongjiang, China;1. Centro de Química Estrutural, Instituto Superior Técnico, Universidade de Lisboa, Av. Rovisco Pais, 1049-001 Lisboa, Portugal;2. Chemical Engineering Department, Instituto Superior de Engenharia Da Lisboa, Instituto Politécnico de Lisboa, R. Conselheiro Emídio Navarro, 1959-007 Lisboa, Portugal;3. Faculty of Chemistry, University of Wroclaw, 14 Joliot-Curie Str., 50-383 Wroclaw, Poland;1. Department of Chemistry and Chemical Technology, Vidyasagar University, Midnapore 721102, West Bengal, India;2. Dipartimento di Scienze Chimiche e Farmaceutiche, Centro di Strutturistica Diffrattometrica, Università di Ferrara, Via L. Borsari, 46, 44100 Ferrara, Italy;3. Departament de Química Inorgànica i Orgànica (Secció de Química Inorgànica) and Institut de Nanociència i Nanotecnologia (IN2UB), Universitat de Barcelona, Martí i Franquès 1-11, 08028 Barcelona, Spain;1. Department of Chemistry, Vijoygarh Jyotish Ray College, Jadavpur, Kolkata 700032, India;2. Department of Chemistry, University of Arkansas at Little Rock, AR 72204, USA;3. Deparment of Chemistry, Guru Ghasidas Vishwavidyalaya, Bilaspur, CG, India |
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| Abstract: | Copper containing methacrylic polymers were prepared by the polymerization of a copper methacrylate complex (Cu[CH2 C(CH3) COO](COD), where COD = 1,5-cyclooctadiene) with different methylmethacrylate and methacrylic acid compositions. These polymers were found to be soluble in many organic solvents including THF and chloroform. Copper nano-networks or aggregated nanoparticles were obtained when a THF solution of the polymers was reduced using an aqueous sodium borohydride solution. When a thin film of the polymers coated on a silicon wafer was irradiated with an electron beam, nanoparticles were produced on the irradiated area, while the non-irradiated areas could be washed away with a weak base developer, such as a tetramethylammoniumhydroxyde (TMAH) aqueous solution, to produce a copper pattern through an electron beam lithography process. |
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| Keywords: | Copper Methacrylic polymer Lithography Pattern Nanomaterial |
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