首页 | 本学科首页   官方微博 | 高级检索  
     

用干涉极值法监控有机电致发光薄膜厚度的研究
引用本文:范希智,李刚正.用干涉极值法监控有机电致发光薄膜厚度的研究[J].光学仪器,1999,21(3):45-48.
作者姓名:范希智  李刚正
作者单位:浙江大学现代光学仪器国家重点实验室!杭州310027
摘    要:根据Abeles 法测量了喔星锌的折射率,为1.697;代替石英晶体振荡法,利用干涉极值法监控,通过真空蒸发镀制了光学厚度(nd)为540nm 的喔星锌有机电致发光薄膜,说明在真空蒸发下干涉极值法监控有机电致发光薄膜的膜厚是有效的。

关 键 词:干涉极值法  喔星锌  电致发光薄膜

Study of Controlling Thickness of Organic Electroluminescent Thin Film with Interferential Maximum Method
FAN Xizhi,LI Gangzheng,ZHU Jun,LIU Xu.Study of Controlling Thickness of Organic Electroluminescent Thin Film with Interferential Maximum Method[J].Optical Instruments,1999,21(3):45-48.
Authors:FAN Xizhi  LI Gangzheng  ZHU Jun  LIU Xu
Abstract:According to Abeles′ method,the refractive index of 8 hydroxyquinoline zinc which is equal to 1.697 was measured.Replacing quartz crystal oscilating method,and controlling with interferential maximum method,and using 8 hydroxyquinoline zinc as luminescent layer the organic electroluminescent thin film with optical thickness of 540 nm was coated with vaccum thermal evaporation deposition.It makes clear that it is effective for interferential maximum method to controll the thickness of the organic electroluminescent thin films.
Keywords:Interferential Maximum Method  8  Hydroxyquinoline Zinc  Electroluminescent Thin Film    
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《光学仪器》浏览原始摘要信息
点击此处可从《光学仪器》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号