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Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross‐Link Agents |
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| Authors: | Marco A Squillaci Feng Qiu Alessandro Aliprandi Fan Zhang Xinliang Feng Paolo Samorì |
| Affiliation: | 1. ISIS & icFRC, University of Strasbourg & CNRS, Strasbourg, France;2. School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, P. R. China;3. Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry, Technische Universit?t Dresden, Dresden, Germany |
| Abstract: | |
| Keywords: | boron‐cored chromophores patterning photoresists organic electronics fluorous materials |