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| 14nm低原子序数材料多层膜的设计和制备 | |
| 引用本文： | 吴文娟,张众,朱京涛,王风丽,陈玲燕,周洪军,霍同林.14nm低原子序数材料多层膜的设计和制备[J].光学精密工程,2011,19(6):1192-1198. |
| 作者姓名： | 吴文娟 张众 朱京涛 王风丽 陈玲燕 周洪军 霍同林 |
| 作者单位： | 1. 上海应用技术学院理学院,上海,201418 2. 同济大学精密光学工程技术研究所物理系,上海,200092 3. 中国科技大学国家同步辐射实验室,安徽合肥,230029 |
| 基金项目： | 国家自然科学基金资助项目(10905042); 上海市高校优秀青年教师科研专项基金资助项目(YYY-08019); 上海应用技术学院引进人才基金资助项目(YJ2007-41) |
| 摘 要： | 为了减小常规多层膜的带宽,提高其光谱分辨率,对采用低原子序数材料组成的适用于极紫外和软X射线波段的多层膜进行了研究.首先,在14 nm波长处选取3种低原子序数材料对Si/B4C,Si/C和Si/SiC组成多层膜,用随机搜索的方法优化设计了这3种多层膜以及在此波段常用的Mo/Si多层膜.然后,用直流磁控溅射的方法制备Si... |
| 关 键 词： | 极紫外与软X射线 多层膜 低原子序数材料 磁控溅射 光谱分辨率 |
Design and manufacture on multilayers of low-Z materials at 14 nm |
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| WU Wen-juan,ZHANG Zhong,ZHU Jing-tao,WANG Feng-li,CHEN Ling-yan,ZHOU Hong-jun,HUO Tong-lin.Design and manufacture on multilayers of low-Z materials at 14 nm[J].Optics and Precision Engineering,2011,19(6):1192-1198. | |
| Authors: | WU Wen-juan ZHANG Zhong ZHU Jing-tao WANG Feng-li CHEN Ling-yan ZHOU Hong-jun HUO Tong-lin |
| Affiliation: | WU Wen-juan1,ZHANG Zhong2,ZHU Jing-tao2,WANG Feng-li2,CHEN Ling-yan2,ZHOU Hong-jun3,HUO Tong-lin3(1.College of Sciences,Shanghai Institute of Technology,Shanghai 201418,China,2.Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,3.National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China) |
| Abstract: | In order to decrease the bandwidth of the normal multilayers and improve the spectral resolution,several kinds of multilayers composed of low-Z materials were investigated in extreme ultraviolet and soft X-ray regions.Firstly,three kinds of multilayers of low-Z materials,Si/B4C,Si/C and Si/SiC multilayers were chosen at the wavelength of 14 nm and these multilayers and a normal Mo/Si multilayer were designed by using a random search method.Then all these multilayers were fabricated with a DC magnetron sputt... |
| Keywords: | extreme ultraviolet and soft X-ray multilayer low-Z materials magnetron sputtering spectral resolution |
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