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半导体工业废水、废气中砷、磷、硫、氟、氯及氮氧化物和重金属的综合治理
引用本文:闻瑞梅.半导体工业废水、废气中砷、磷、硫、氟、氯及氮氧化物和重金属的综合治理[J].电子学报,2000,28(11):1-3.
作者姓名:闻瑞梅
作者单位:同济大学,上海 200092
摘    要:本文介绍了在半导体工业废水、废气中砷、磷、硫、氟、氯及氮氧化物、重金属及各种酸的综合治理方法、工艺流程和设备,用中和絮凝沉降一体化装置,利用共生沉淀的原理处理废水.用椭圆型喷淋吸收塔,氧化剂、碱吸收治理半导体工业废气中砷、磷、硫、氟、氯、氮氧化物及各种酸.经环保部门检测均达到国家排放标准.

关 键 词:半导体  废水  废气  治理  
文章编号:0372-2112(2000)11-0001-03
收稿时间:1999-07-26

A Comprehensive Abatement Technology for Arsine, Phosphorus, Sulfur, Fluorine, Chlorine, Oxynitrides and Heavy Metals in Semiconductor Industry Waste Water and Gases
WEN Rui-mei.A Comprehensive Abatement Technology for Arsine, Phosphorus, Sulfur, Fluorine, Chlorine, Oxynitrides and Heavy Metals in Semiconductor Industry Waste Water and Gases[J].Acta Electronica Sinica,2000,28(11):1-3.
Authors:WEN Rui-mei
Affiliation:Tongji Univeristy,Shanghai 200092,China
Abstract:A comprehensive technology including flow chart and setup was described for pollution control of arsine,phosphorus,sulfur,fluorine,chlorine,oxynitrides,heavy metals and various acids in semiconductor industry waste water and gases.The waste water was treated in a combined neutralization sedimentation setup based on the principle of codeposition.A dual absorbing tower shower containing oxidant and alkaline absorbant was used for removing arsine,phosphorus,sulfur,fluorine,chlorine and oxynitrides.After abatement the concentration of pollants analyysed by Environmental Administration meets the State Standard of Emission.
Keywords:semiconductor  waste water  waste gases  abatement
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