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Conductive Properties of Electron Beam Evaporated a-Si_(1-x) Gd_x Films
引用本文:甘润今,张津燕. Conductive Properties of Electron Beam Evaporated a-Si_(1-x) Gd_x Films[J]. 中国稀土学报(英文版), 1993, 0(3)
作者姓名:甘润今  张津燕
作者单位:Department of Physics Lanzhou University,Lanzhou 730000,China,Department of Physics,Lanzhou University,Lanzhou 730000,China
摘    要:The properties of temperature dependence of conductivity σ of electron beam evaporateda-Si_(1-x)Gd_x films which was deposited on some substrates of glass and Al-foil at a substrate temperature ofapproximately 300℃ in a background pressure about 2×10~(-4) Pa with a deposition speed about 0.2 nm/swas analyzed and studied.The forms of Gd~(3+) ions in the films,the dangling bond compensation achieved byGd~(3+) ions and the impurity states compensation achieved by structural disorder aroused by doping Gd ele-ment into a-Si film could be the key factors in resolving the properties of conduction in a-Si_(1-x)Gd_x films.Inthe temperature region of 290 K

Conductive Properties of Electron Beam Evaporated a-Si_(1-x) Gd_x Films
Gan Run-Jin Zhang Jin-Yan. Conductive Properties of Electron Beam Evaporated a-Si_(1-x) Gd_x Films[J]. Journal of Rare Earths, 1993, 0(3)
Authors:Gan Run-Jin Zhang Jin-Yan
Abstract:
Keywords:Conductivity  Rare earth  a-Si film  Dangling bond
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