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Ag surfactant effects of TiO2 films prepared by sputter deposition |
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| Authors: | Masao Kamiko Kazuaki Aotani Ryo Suenaga Jung-Woo Koo Jae-Geun Ha |
| Affiliation: | aInstitute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan;bDepartment of Material Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan;cDepartment of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, Republic of Korea |
| Abstract: | The surfactant effect of Ag on the thin film structure of TiO2 by radio frequency magnetron sputtering has been investigated. Comparisons between the atomic force microscopy images revealed that the surface roughness of TiO2 film mediated by Ag was smaller than that of the TiO2 film without Ag. The surface segregation effect of Ag was confirmed using X-ray photoelectron spectroscopy. The results of X-ray diffraction revealed that the initial deposition of a 0.4 nm thick Ag surfactant layer onto a Fe buffer layer prior to the deposition of the TiO2 film reduced the rutile (110) growth and enhanced the anatase (100) growth. It was concluded that Ag was an effective surfactant for changing the thin film structure of TiO2 on the Fe buffer layer. The photocatalytic effect of the fabricated TiO2 film was also investigated using the remote oxidation process. TiO2 films with the Ag surfactant exhibited higher photocatalytic activity than conventionally deposited TiO2 films. |
| Keywords: | Crystal growth Surfactant Thin film structure Sputtering Processes Titanium dioxides Photocatalyst material |
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