Structural characteristics and high-temperature oxidation behaviour of nano-HfO2-doped thermal barrier coatings |
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Affiliation: | 1. College of Mechanical and Electrical Engineering, Jiangxi University of Science and Technology, Ganzhou, 341000, China;2. National Key Laboratory for Remanufacturing, Army Academy of Armored Forces, Beijing, 100072, China;3. National Engineering Research Center for Remanufacturing, Army Academy of Armored Forces, Beijing, 100072, China |
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Abstract: | The uneven growth of thermally grown oxides (TGOs) in thermal barrier coating systems is an important cause of cracking failure at the coating interface in high-temperature environments. The doping of rare earth elements in the bonding layer can effectively inhibit the formation of spinel oxides in the TGO and improve the high-temperature oxidation resistance of the coating. However, a single rare earth element has a limited effect on inhibiting TGO failure. In this study, a NiCoCrAlYHf coating was prepared using a supersonic flame spraying (HVOF) technique. The effects of HfO2 doping on the high-temperature oxidation behaviour of the coatings and diffusion behaviour of metallic elements in the coatings were investigated at 1100 °C. The results showed that the nano-sized HfO2 filled the pores between the powder particles and improved the hardness of the coating. During the high-temperature oxidation process, the oxides formed by Hf and Y had a large size and low solubility, which effectively blocked the diffusion of Al. This slowed the generation of spinel oxides, effectively inhibited the growth of the TGO, it inhibits the initiation and propagation of cracks within the coating, reduces damage to the coating from tensile and compressive stresses at the interface, and improved the high-temperature oxidation resistance of the coating. |
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Keywords: | Thermal barrier coating NiCoCrAlY Structural characteristics TGO High-temperature oxidation |
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