Passivation effect on the surface characteristics and corrosion properties of yttrium oxide films undergoing SF6 plasma treatment |
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| Affiliation: | 1. Department of Materials Science and Engineering, Da-Yeh University, Changhua, 51591, Taiwan, ROC;2. Graduate Institute of Materials Science and Green Energy Engineering, National Formosa University, Huwei, Yunlin, 632, Taiwan, ROC;3. Department of Industrial Engineering and Management, Da-Yeh University, Changhua, 51591, Taiwan, ROC |
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| Abstract: | This study investigates the structures, compositions and fluorocarbon-plasma etching behaviors of yttrium oxyfluoride (YOF) passivation films fabricated on sputter-deposited yttrium oxide (Y2O3) by high-density SF6 plasma irradiation. High-resolution transmission electron microscopy and nano-beam electron diffraction confirmed a YOF passivation film containing multiple phases of (104) and (006) crystal planes was formed on the fluorinated Y2O3 surface. X-ray photoelectron spectroscopy revealed few changes in the chemical compositions and surface roughness of the YOF passivation film after fluorocarbon plasma etching, confirming the chemical stability of the SF6 plasma-treated Y2O3 sample. The etching depth was ～20% lower on the SF6 plasma-treated Y2O3 film than on the commercial Y2O3 coating. These results showed that the SF6 plasma-treated Y2O3 films have an excellent erosion resistance properties compared to the commercial Y2O3 coatings. |
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| Keywords: | Films Surfaces Corrosion Plasma etching Microstructural |
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