Structure and properties of ta-C films prepared by vacuum cathodic arc with an unbalanced external electromagnetic field

ta-C thin films were deposited by vacuum cathodic arc technology with an unbalanced external electromagnetic field. The intensity of the magnetic field was adjusted by changing coil current and its effect on structure and properties of ta-C films was studied. FEM simulation results showed that as coil currents increased, the transverse, normal magnetic field and the magnetic intensity from arc cathode to substrates holder gradually increased. The UBM system increases the magnetic field intensity of the entire vacuum chamber by mainly improving the normal magnetic flux density near the arc cathode. The surface morphology, microstructure, tribo-mechanical properties of ta-C films were analyzed by SEM, Raman spectrometer, XPS, 3D surface profiler, Nano-indentation and ball-on-disk tribometer. Results showed that as the coil current increased, the average target voltage increased from 21.14 V to 25.97 V and target power rose from 845 W to 1043 W. Changes of magnetic field affected the plasma in vacuum chamber and the number of ions reaching the substrates, which had significant influences on film structure and properties. With a proper magnetic field (at coil current of 4A), ta-C films perform the highest hardness of 58.8 GPa, and the highest sp³ content of about 71% with the lowest ratio of I_D/I_G (0.38). During the wear process, the transfer layer was formed by oxidation and graphitization of contact surfaces. High hardness provided good support for transfer film, which leads to a low wear rate.