High-performance indium-free flexible transparent ATO/Au/ATO tri-layer films by magnetron sputtering

Due to the scarcity of indium (In) in the earth and its potential harm to individuals, the development of In-free transparent conductive film is considered crucial. In this work, In-free SnO₂:Sb/Au/SnO₂:Sb (ATO/Au/ATO, SAS) tri-layer films with high transparency and conductivity were successfully prepared on polycarbonate (PC) substrates by RF and DC magnetron sputtering at room temperature. The influence of the Au layer thickness on microstructure, electrical and optical performances was systematically studied after fixing the ATO thickness to 50 nm. It was indicated by X-ray diffraction patterns that ATO is amorphous and Au is oriented along (111). The trend of increasing and then decreasing light transmission with Au layer thickness was observed in both experimental and simulation results. The improved figure of merit (FoM, 1.89 × 10^?2 Ω^?1) was achieved in SAS tri-layer film, the resistivity and average transmittance of which was lowered to 7.50 × 10^?5 Ω cm and 81.4%, respectively, when Au layer thickness is 11 nm. Moreover, the mechanism of the variation of optical and electrical properties at different Au layer thickness was proposed. Particularly, the SAS tri-layer films also exhibit superior flexibility, durability and adhesion. These results demonstrate SAS tri-layer films are promising alternative to ITO in flexible electronics applications.