首页 | 本学科首页   官方微博 | 高级检索  
     


Optimization of 3C–SiC/Si heterointerfaces in epitaxial growth
Authors:P. Masri, M. Rouhani Laridjani, T. W  hner, J. Pezoldt,M. Averous
Affiliation:

a Groupe d'Etude des Semiconducteurs, CNRS, UMR 5650, Université Montpellier 2, cc074, 12 Place E. Bataillon, 34095, Montpellier CEDEX 5, France

b TU Ilmenau, Institut für Festkörperelektronik, PSF 100565, 98684, Ilmenau, Germany

Abstract:In this article, we present the basic formalism of the S-correlated theory of misfit induced interface superstructures (MIIS) and nucleation centers for misfit dislocation network (NCMDN). Two main properties play an important role in the theory. The first one is the S factor, which is the ratio of effective elastic constants over the material atomic density: this factor can be identified from the standard equations of the elasticity theory which, in our approach, represents the basic background. This implies a realistic lattice dynamics model which enables to interpret the velocity of longitudinal, transverse and shear vibrational waves in solids. The second property, nS is a geometric parameter related to the extension of MIIS and to the lattice spacing of misfit dislocation network (MDN). We then apply this theory to several heterosystems and we demonstrate that it can be used to optimize heterointerfaces between host materials characterized by large lattice mismatch.
Keywords:Physics of epitaxy   Interface optimization
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号