Low-frequency dispersion of transconductance in GaAs JFETs andMESFETs with an ion-implanted channel layer

An analytical model of low-frequency dispersion of transconductanced in GaAs FETs which have nonuniform profiles of carrier concentration and mobility is reported. The frequency dependence of surface charge density is incorporated into the model as a variation in the source resistance of the FETs. The model explains the low-frequency dispersion of transconductance in GaAs p-n junction FETs (JFETs) and metal-semiconductor FETs (MESFETs), both of which have a channel layer formed by ion implantation. It is suggested that the low-frequency dispersion of transconductance can be attributed to the charge exchange which occurs with the surface states in GaAs FETs