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纳米晶体Ti表面磁控溅射CN_x/SiC双层薄膜的干摩擦磨损性能
引用本文:许晓静,宗亮,卓刘成,郝欣妮,陈丹. 纳米晶体Ti表面磁控溅射CN_x/SiC双层薄膜的干摩擦磨损性能[J]. 真空科学与技术学报, 2010, 30(2). DOI: 10.3969/j.issn.1672-7126.2010.02.21
作者姓名:许晓静  宗亮  卓刘成  郝欣妮  陈丹
作者单位:江苏大学先进成形技术研究所,镇江,212013
基金项目:江苏大学优秀学术青年骨干培养对象基金、江苏省摩擦学重点实验室基金资助项目 
摘    要:采用室温磁控溅射技术在纳米晶体钛表面制备出CNx/SiC双层薄膜,SiC为中间层。研究了CNx薄膜的纳米压痕行为和摩擦磨损性能。试验结果表明:CNx薄膜的纳米硬度、杨氏弹性模量、硬度与弹性模量比值分别为8.03GPa,55.0GPa和0.146;在200g载荷、氮化硅球(半径为2mm)为对摩件、大气干摩擦条件下,CNx薄膜的磨损速率为10-6mm3m-1N-1级,摩擦系数约为0.159,磨损后薄膜未出现裂纹和剥落。分析表明,摩擦系数和摩擦化学有关,良好的抗磨性能和硬度与弹性模量比值较之是相一致的。

关 键 词:钛基材  薄膜  纳米压痕  摩擦磨损  磁控溅射

Dry Friction/Wear Behavior of Magnetron Sputtered CN_x/SiC Bilayered Films on Nanocrystal Ti Substrates
Xu Xiaojing,Zong Liang,Zhuo Liucheng,Hao Xinni,Chen Dan. Dry Friction/Wear Behavior of Magnetron Sputtered CN_x/SiC Bilayered Films on Nanocrystal Ti Substrates[J]. JOurnal of Vacuum Science and Technology, 2010, 30(2). DOI: 10.3969/j.issn.1672-7126.2010.02.21
Authors:Xu Xiaojing  Zong Liang  Zhuo Liucheng  Hao Xinni  Chen Dan
Affiliation:Xu Xiaojing,Zong Liang,Zhuo Liucheng,Hao Xinni,Chen Dan(Institute of Advanced Forming Technology,Jiangsu University,Zhenjiang 212013,China)
Abstract:The mechanical properties of the CNx/SiC bilayered coatings,deposited by magnetron sputtering at room temperature on nanocrystal Ti substrates,were studied.The results show that the CNx film has a nano-hardness of 8.03GPa,a Young modulus of 55.0GPa,and a hardness-to-modulus ratio of 0.146.When sliding against silicon nitride ball,2mm in diameter,under ambient environment at a load of 200g,the friction coefficient of the CNx film was found to be 0.159,with a specific wear rate up to the magnitude of 10-6 mm3...
Keywords:Titanium substrate  Thin films  Nano-indentation  Friction and wear  Magnetron sputtering
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