| 适用于小型生产线运行的单晶圆清洗技术的实现 |
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| 引用本文： | Takeshi Hattori. 适用于小型生产线运行的单晶圆清洗技术的实现[J]. 电子工业专用设备, 2007, 36(6): 16-23 |
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| 作者姓名： | Takeshi Hattori |
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| 作者单位： | Sony Semiconductor |
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| 摘 要： | 利用臭氧消毒水和淡氟氢酸清洗技术,使设备生产厂家的单晶圆旋转清洗工艺适应向小型生产线转入的应用,从而使生产周期的缩短成为可能。
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| 关 键 词： | 单晶圆清洗 小型生产线 湿法清洗 金属去除 表面污染控制 |
| 文章编号： | 1004-4507（2007）06-0016-08 |
Implementing a single-wafer cleaning technology suitable for minifab operations |
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| Takeshi Hattori. Implementing a single-wafer cleaning technology suitable for minifab operations[J]. Equipment for Electronic Products Marufacturing, 2007, 36(6): 16-23 |
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| Authors: | Takeshi Hattori |
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| Affiliation: | Sony Semiconductor |
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| Abstract: | The use of a single-wafer spin cleaning process using ozonated water and dilute hydrogen fluoride accommodates a manufacturer's shift to minifab operations, where shorter cycle times are possible. |
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| Keywords: | Single-Wafer Cleaning Minifab Wet Cleaning Processes Metal Removal. Surface Contamination Control |
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