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| 碳纳米管薄膜的场发射及其有效发射面积 | |
| 引用本文： | 董建会,曾葆青,田时开,崔文丽. 碳纳米管薄膜的场发射及其有效发射面积[J]. 微纳电子技术, 2009, 46(10). DOI: 10.3969/j.issn.1671-4776.2009.10.005 |
| 作者姓名： | 董建会 曾葆青 田时开 崔文丽 |
| 作者单位： | 1. 中北大学,理学院,物理系,太原,030051;中国科学院,山西煤炭化学研究所,太原,030001 2. 电子科技大学物理电子学院,成都,610054 3. 中北大学,理学院,物理系,太原,030051 |
| 摘 要： | 讨论了薄膜与阳极间隔以及有效发射面积对碳纳米管薄膜场发射性能的影响。以磁控溅射Al和Ni在Si片上做为缓冲层和催化剂,以乙炔为C源气体,利用化学气相沉积法制备了碳纳米管薄膜。扫描电镜观测结果表明,碳纳米管的直径为50～80nm。采用二极管结构,测试了样品的场发射性能,结果表明碳纳米管薄膜具有优异的场发射特性,薄膜与阳极距离为400μm时开启场为0.85V/μm、阈值场为1.22V/μm。F-N理论计算结果表明,碳纳米管薄膜的有效发射面积几乎不随场发射所加电压的变化而改变;有效发射面积随着薄膜与阳极距离的增加而增大。 |
| 关 键 词： | 场发射 F-N理论 有效发射面积 碳纳米管 磁控溅射 |
Field Emission Characteristics and Effective Emission Area of Carbon Nanotube Films |
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| Dong Jianhui,Zeng Baoqing,Tian Shikai,Cui Wenli. Field Emission Characteristics and Effective Emission Area of Carbon Nanotube Films[J]. Micronanoelectronic Technology, 2009, 46(10). DOI: 10.3969/j.issn.1671-4776.2009.10.005 | |
| Authors: | Dong Jianhui Zeng Baoqing Tian Shikai Cui Wenli |
| Affiliation: | Dong Jianhui1,3,Zeng Baoqing2,Tian Shikai2,Cui Wenli1 (1.Department of Physics,School of Science,North University of China,Taiyuan 030051,China,2.School of Physical Electronics,University of Electronic Science , Technology of China,Chengdu 610054,3.Institute of Coal Chemistry,CAS,Taiyuan 030001,China) |
| Abstract: | Effects of the sample-anode distance(the interval between sample and anode) and effective emission area on the field emission characteristics of carbon nanotube films were discussed.Si substrate was coated with Al and Ni films as the buffer layer and catalyzer in sequence by a magnetic sputtering method,and carbon nanotube films were grown on Si substrate by thermal chemical vapor deposition with acetylene as the precursors.The SEM was used to determine the structure of the films.The results show that the d... |
| Keywords: | field emission Fowler-Nordheim theory effective emission area carbon nanotube(CNT) magnetic sputtering |
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