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Preparation and characterization of copper(II) oxide thin films grown by a novel spray pyrolysis method
Affiliation:1. Department of Chemistry, Brown University Providence, RI 02912 USA;1. Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;2. Department of Scientific Laboratories - Physics, Sudan University of Science and Technology, P.O Box 407, Khartoum, Sudan;1. Centro de Investigación y de Estudios Avanzados del I.P.N., Unidad Querétaro, Querétaro, Qro 76230, Mexico;2. Depto. de Física., Centro de Investigación y de Estudios Avanzados del I.P.N., A.P. 14-740, Ciudad de Mexico, 07360, Mexico;1. Laboratory of Electrochemistry-Corrosion, Metallurgy and Inorganic Chemistry, Faculty of Chemistry, USTHB, BP 32, 16111, Algiers, Algeria;2. Laboratory of Storage and Valorization of Renewable Energies, Faculty of Chemistry, USTHB, BP 32, 16111, Algiers, Algeria;1. Department of Electrical and Computer Engineering, Isfahan University of Technology, Isfahan 84156-83111, Iran;2. Physics Department, University of Isfahan, Isfahan, Iran;1. Department of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-S2-20 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan;2. Toshiba Material Co., LTD, 8, Shinsugita-Cho, Isogo-Ku, Yokohama 235-8522, Japan;3. Frontier Research Center, Tokyo Institute of Technology, 4259-S2-20 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
Abstract:A novel spray pyrolysis reactor was used to prepare thin films of CuO on silica substrates. The resulting films were characterized by x-ray diffraction, electron microscopy, optical and electrical measurements. The films were single phase, homogeneous, and uniform.
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