In situ FTIR experimental results in the silylation of low-k films with hexamethyldisilazane dissolved in supercritical carbon dioxide |
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| Affiliation: | 1. Center of Excellence for Advanced Materials Research (CEAMR), King Abdulaziz University, Jeddah 21589, P.O. Box 80203, Saudi Arabia;2. Department of Chemistry, Faculty of Science, King Abdulaziz University, Jeddah 21589, P.O. Box 80203, Saudi Arabia;3. GIK Institute of Engineering Sciences and Technology, Topi 23640, Swabi, Pakistan;4. Center for Innovative Development of Science and New Technologies, Aini St., 299/2, Dushanbe 734063, Tajikistan |
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| Abstract: | In situ Fourier Transform Infrared Spectroscopy measurements were performed using an innovative equipment to study the surface modification reaction between a functionalized porous MSQ-film and hexamethyldisilazane (HMDS) dissolved in CO2 at supercritical conditions (scCO2). scCO2 was used in the heterogeneous reaction due to enhancing properties, ideal for porous materials. Different infrared signatures, from the gas and solid phases, were observed and identified, implying gas–gas and solid–gas phase reactions. Among the different component signatures observed in the gas phase, carbonic acid was observed as a possible silylating gas phase nucleophilic component, while in the solid phase the predominant reaction mechanism proceeded by forming Si OSi bonds and Trimethylaminosilane (as gas phase product). |
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| Keywords: | HMDS In situ FTIR Silylation Heterogeneous reaction Low-k |
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