An analytic study of (GaAl)As gain guided lasers at threshold |
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Authors: | Streifer W. Burnham R. Scifres D. |
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Affiliation: | Xerox Palo Alto Research Center, Palo Alto, CA, USA; |
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Abstract: | An analysis of gain-guided diode lasers at threshold is presented. After describing the formulation, the effects of charge induced real refractive index antiguiding and gain-charge density relations are studied in detail. Their influence on the threshold current, modal distributions, and the lateral fax-field radiation patterns is discussed. Next a "model" laser is defined and each parameter including dimensions, compositions, stripewidth, diffusion constants, current spreading resistance, and facet reflectivities is individually varied to determine the resulting modifications in laser properties. |
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