Reliability studies on GaAs MESFETs fabricated using spin-onplatinum source

GaAs MESFETs were fabricated using a spin-on platinum source as the gate material. They were subsequently aged at 200°C for up to 1000 h. DC electrical characterisation of the MESFETs was carried out during various stages of annealing. The aging behaviour of these MESFETs was compared with those fabricated using conventionally evaporated platinum sources. The results show that the performance of the MESFETs fabricated using a spin-on platinum source is comparable to those of MESFETs fabricated using a conventionally evaporated platinum source