Submicrometre X-ray printing with X-ray masks delineated by high-voltage electron-beam writing |
| |
| Authors: | Kawabuchi K. Sakurai S. Yoshimi M. |
| |
| Affiliation: | Toshiba Corporation, Integrated Circuits Laboratory, Toshiba Research & Development Center, Kawasaki, Japan; |
| |
| Abstract: | High-voltage electron-beam writing has been successfully utilised to fabricate high-resolution and high-accuracy X-ray masks with vertical-wall gold patterns which have made it possible to print a ? ?m resist pattern without any pattern size variation across steps. |
| |
| Keywords: | |
|
|
