AFM investigation of thin post-baked photoresistive films for microsystem technology application |
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| Authors: | S E Alexandrov A B Speshilova Y V Soloviev O I Ermeychik |
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| Affiliation: | (1) St. Petersburg State Polytechnical University, St. Petersburg, 195251, Russia |
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| Abstract: | In this paper, we discuss the application of photoresist films as the sacrificial layers for “bridge” working elements in
microsystem technology. Different regimes and conditions of post-baking and plasma chemical etching processes for the formation
of sacrificial layers with precise thickness and roughness are investigated. The photoresist surface morphology was observed
with the help of atomic force and scanning electron microscopy.
The text was submitted by the authors in English. |
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