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亚微米尺寸金属电极的制备工艺
引用本文:湛治强,阎大伟,熊政伟,沈昌乐,彭丽萍,罗跃川,王雪敏,吴卫东.亚微米尺寸金属电极的制备工艺[J].太赫兹科学与电子信息学报,2015,13(4):646-648.
作者姓名:湛治强  阎大伟  熊政伟  沈昌乐  彭丽萍  罗跃川  王雪敏  吴卫东
作者单位:a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China,a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China and a.Research Center of Laser Fusion;b.Microsystem and Terahertz Research Center,China Academy of Engineering Physics,Mianyang Sichuan 621999,China
摘    要:亚微米尺寸金属电极在高电子迁移率晶体管(HEMT)等半导体电子学器件中有重要应用,其制作是器件制作中的关键工艺,对器件性能有着重要影响。本文选择合适的涂胶旋转转速、烘烤温度(180℃)和时间,可以有效地减少电子束曝光后所产生的气泡。通过对聚甲基丙烯酸甲酯/聚二甲基戊二酰亚胺(PMMA/PMGI)双层胶进行电子束曝光和显影,确定了合适的曝光剂量为550 μC/cm2。通过调整显影液配比,并将显影时间控制在合理范围,获得了光滑完整的PMMA/PMGI双层光刻胶曝光图形。开发了双层光刻胶电子束曝光工艺,制备出宽度为200 nm的金属电极。

关 键 词:双层胶  亚微米  电子束曝光  金属电极
收稿时间:2014/10/29 0:00:00
修稿时间:2015/1/22 0:00:00

Preparation of submicron-sized metal electrodes
ZHAN Zhiqiang,YAN Dawei,XIONG Zhengwei,SHENG Changle,PENG Liping,LUO Yuechuan,WANG Xuemin and WU Weidong.Preparation of submicron-sized metal electrodes[J].Journal of Terahertz Science and Electronic Information Technology,2015,13(4):646-648.
Authors:ZHAN Zhiqiang  YAN Dawei  XIONG Zhengwei  SHENG Changle  PENG Liping  LUO Yuechuan  WANG Xuemin and WU Weidong
Abstract:
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