氟化非晶碳(a-C:F)薄膜的研究

氟化非晶碳(a-C：F)薄膜是一种电、光学新材料。介绍了它的制备方法，对其制备工艺作了较全面的探讨；分析了该膜制备方法和工艺参数对薄膜组分及化学键结构的影响；研完了该膜的电学、光学、热学、力学等物理性质及其在相关方面的应用，并对该膜的物理性质与制备工艺参数的关联作了详细的论述；指出介电常数和热稳定性的矛盾是阻碍该膜实用化的主要原因。

A Review of Research on Fluorinated Amorphous Carbon Thin Films

Fluorinated amorphous carbon thin films are a group of new materials used in the electrical and optical fields. In this paper,the preparation methods of these films are described and the deposition conditions are considered comprehensively. The influence of preparation methods and deposition conditions on the film composition and the bonding structures are analyzed. The authors also review the electrical,optical,calorific and mechanical properties and applications of the films,and discuss the relationship between the physical properties and deposition conditions in details. We point out that striking a proper trade-off between dielectric constant and thermal stability is the key to commercial application of the films.