Thin functional films by combustion chemical vapour deposition (C-CVD) |
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| Authors: | Thomas Struppert |
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| Affiliation: | INNOVENT e.V., Departement of Surface Engineering, Prüssingstr. 27B, 07745 Jena, Germany |
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| Abstract: | The use of the atmospheric pressure C-CVD (combustion chemical vapour deposition) process for the deposition of thin functional layers on float glass and plastics is described. We will give an overview on the variety of materials that can be deposited and some examples, like SiO2, WOx and Ag, are presented in more detail with potential applications. |
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| Keywords: | Surface functionalization Combustion CVD Atmospheric pressure Oxides |
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