| 直流磁控溅射沉积WO3薄膜电致变色性能研究 |
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| 引用本文： | 何延春,邱家稳.直流磁控溅射沉积WO3薄膜电致变色性能研究[J].真空与低温,2007,13(1):16-20. |
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| 作者姓名： | 何延春 邱家稳 |
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| 作者单位： | 兰州物理研究所,表面工程技术国家级重点实验室,甘肃,兰州,730000 |
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| 摘 要： | 以金属钨为靶材,采用直流反应磁控溅射方法,在玻璃上制备电致变色WO3薄膜.利用X射线衍射(XRD)方法对薄膜的结构进行了分析,得出了WO3薄膜的沉积工艺.制备了WO3/TTO/Glass电致变色器件,并对其性能进行了研究.结果表明在Li+注入前后,薄膜的透射率平均变化约50%,具有较好的可逆变色特性;Li+注入后,WO3薄膜中的一部分W6+变为W5+,转化比例约为25%.
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| 关 键 词： | 直流磁控溅射 电致变色 薄膜 |
| 文章编号： | 1006-7086(2007)01-0016-05 |
| 修稿时间： | 2007年1月15日 |
THE ELECTROCHROMIC PROPERTIES OF WO3 THIN FILMS BY DC MAGNETRON SPUTTERING |
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| HE Yan-chun,QIU Jia-wen.THE ELECTROCHROMIC PROPERTIES OF WO3 THIN FILMS BY DC MAGNETRON SPUTTERING[J].Vacuum and Cryogenics,2007,13(1):16-20. |
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| Authors: | HE Yan-chun QIU Jia-wen |
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| Abstract: | Using pure tungsten as target,WO3 thin films were prepared on glass substrate by DC reactive magnetron sputtering.Its crystal structures were analyzed by X-ray diffraction(XRD) method.The deposition technology of the WO3 thin film was obtained.Electrochromism device of WO3/ITO/Glass was prepared and its properties were studied.The experimental results showed that the transmissivity of the WO3 thin film changed about 50% after the Li ions in jection.The device has a preferably reversible electrochromism performance,about 25% of W6+ in the WO3 thin film change to W5+. |
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| Keywords: | WO3 |
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