Polymers of α-substituted benzyl methacrylates as a new type of electron-beam resist

Summary Polymer of α-substituted benzyl methacrylate was found to be used as a new type of positive electron-beam resist, which forms methacrylic acid units in the polymer chain on the exposure to electron-beam and can be developed using alkaline solution as a developer. The sensitivity was dependent on the bulkiness of the ester group and the number of ?-hydrogen atoms in the ester group. The sensitivity and γ-value of atactic poly(α, α-dimethylbenzyl methacrylate) were improved by a factor of more than three over poly (methyl methacrylate).