PCB曝光机照明系统的均匀性仿真与研究

近年来,电子信息类产品在不断地追求着高性能化,印刷电路板也随之高密度、微线化。紫外线曝光机是印制板制造工艺中的重要设备,而光学曝光作为PCB制作工艺过程中的一个重要环节对光照度的均匀性要求比较严格,现应用非成像光学的设计方法,实现了一种新型的曝光机均匀照明系统,并使用基于蒙特卡罗法的光线追迹软件对该光学系统进行了模拟仿真。实验表明,采用该研究设计的照明系统能够改善PCB曝光机紫外照明光源的配光性能,光强分布均匀稳定、能够满足光学曝光过程对光源的指标要求,具有可操作性。

Uniformity simulation and research based on PCB exposure machine illuminating system

In recent years, the electronic information products tend to be increasingly powerful. With it, the printed circuit board has become more and more intensive and micro-wire technology. Therefore, as an important equipment in the PCB manufacturing process, the UV exposure machine have a high requires for the uniformity of the illumination in the optical exposure process which is a key part in the PCB producing process. This thesis applies the design methods of non-imaging optics to create a new type of equal illumination system in the exposure machine, and use the ray tracing software which base on the methods of Monte Carlo to simulate the new illumination system. Experimental results showed that this new system has significantly improved the optical properties of PCB exposure of UV light source. The consequence of the experiment meets with the requirements of the illumination in the optical exposure process. Furthermore, this method is more simple and convenient than other methods.