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Influence of quantum-well width on device performance ofAl0.30Ga0.70As/In0.25Ga0.75As (on GaAs) MODFETs
Authors:Nguyen  LD Radulescu  DC Foisy  MC Tasker  PJ Eastman  LF
Affiliation:Sch. of Electr. Eng., Cornell Univ., Ithaca, NY ;
Abstract:An experimental study in which the quantum well width (W) is varied from 45 to 200 Å is discussed. Optimum device performance was observed at a well width of 120 Å. The 0.2-μm×130-μm devices with 120-Å quantum-well width typically exhibit a maximum channel current density of 550 mA/mm, peak transconductance of 550 mS/mm, and peak current gain cutoff frequency ( fT) of 122 GHz. These results have been further improved in subsequent fabrications employing a trilevel-resist mushroom-gate process. The 0.2-μm×50-μm devices with mushroom gate exhibit a peak transconductance of 640 mS/mm, peak f T of 100 GHz, and best power gains cutoff frequency in excess of 200 GHz. These results are among the best ever reported for GaAs-based FETs and are attributed to the high two-dimensional electron gas (2DEG) sheet density, good low-field mobility, low ohmic contact, and the optimized mushroom gate process
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