Melt memory effects on recrystallization of polyamide 6 revealed by depolarized light scattering and small‐angle X‐ray scattering

Melt memory effects on recrystallization of polyamide 6 were studied in a length scale from nm to μm using small‐angle X‐ray scattering (SAXS) and depolarized light scattering (DPLS). The memory effects on recrystallization rate were discussed in terms of the incubation period before nucleation and the half time of the crystallization, which were measures of the nucleation rate and the growth rate, respectively. Both rates are almost independent of the annealing temperature of the melt in the remelting process for the short term annealing below ～ 3 min while they are slowed as the annealing temperature increases for the long term annealing, showing that the relaxation of melt memory takes very long even above the equilibrium melting temperature T. Extrapolating the incubation period to infinite annealing, time we found that it was very hard to attain the fully relaxed state in polyamide 6 even above the equilibrium melting temperature. This must be due to the strong hydrogen bonding in polyamide 6. We also discuss the memory effects on the final structure after recrystallization based on the SAXS and DPLS profiles. © 2011 Wiley Periodicals, Inc. J Appl Polym Sci, 2011