基于不同金属衬底制备碳膜的场发射研究

利用磁控溅射的方法，在相同的陶瓷衬底上面分别镀上三种不同金属，形成三种不同的金属衬底，对金属层进行相同的表面处理后，放入微波等离子体化学气相沉积腔中，制备出三种碳膜。对制备出不同的碳膜用扫描电镜、拉曼光谱、X射线衍射仪进行结构分析，并用二极管型结构测试了它们的场致发射电子的性能。找到了最适合场发射的金属衬底，进一步对不同金属衬底制备碳膜的场发射特性不同的原因进行了初步的研究。

Substrate for micron diamond film preparation and properties of influence

By changing the processing method on the surface of the substrate, different micron diamond film is prepared. Specific method is to use the magnetron sputtering plating on ceramic substrate on a thick layer of titanium, the titanium layer with different surface treatment, after put in microwave plasma chemical vapor deposition in the cavity preparation micron diamond film. Of different type film using diode structure to test the performance of their field emission electron, can achieve a good surface treatment under the electric field of 2.1 V/u m, 9.2 mA/cm2 excellent effect. And emission mechanism and the field emission properties were studied. Keywords: Micron diamond, thin film preparation, field emission electron, microwave plasma chemical vapor deposition.