| 氧化亚铜的电化学沉积 |
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| 引用本文： | 陈长毅. 氧化亚铜的电化学沉积[J]. 淮阴工学院学报, 2013, 0(1): 41-45 |
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| 作者姓名： | 陈长毅 |
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| 作者单位： | 淮安市产品质量监督检验所 |
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| 摘 要： | 通过电化学沉积的方法制备Cu2O,采用X-射线衍射和扫描电镜技术表征产物的形貌和晶体结构。考察沉积电位、沉积时间、前驱物的浓度等实验参数对产物形貌的影响,实验表明可通过调节实验参数控制产物的形貌和尺寸。
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| 关 键 词： | 电化学沉积 氧化亚铜 形貌 尺寸 |
Electrochemical Deposition of Cuprous Oxid |
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| CHEN Chang-yi. Electrochemical Deposition of Cuprous Oxid[J]. Journal of Huaiyin Institute of Technology, 2013, 0(1): 41-45 |
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| Authors: | CHEN Chang-yi |
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| Affiliation: | CHEN Chang-yi (Huai’an Institute of Supervision & Inspection on Product Quality of Jiangsu Province, Huai’an Jiangsu 223001,China) |
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| Abstract: | A facile aqueous electrochemical deposition approach was developed for the deposition of cuprous ox- id. The morphology and structure of the as -prepared products were characterized by the techniques of powder X -ray diffraction （XRD） and scanning electron microscopy （SEM）. The influencing factors such as deposi- tion potential, time, the concentration of cuprum nitrate and the ratio of cuprum nitrate and （ EDTA） were stud- ied in the deposition process. It was observed that the size and morphology of the as - obtained products were al- tered by experimental parameters. |
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| Keywords: | electrochemical deposition cuprous oxid morphology size |
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