| 溅射富Ti-TiNi形状记忆合金薄膜 |
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| 引用本文： | 单凤兰,霍艳玲,罗浩斌,王煜明. 溅射富Ti-TiNi形状记忆合金薄膜[J]. 稀有金属材料与工程, 1999, 28(2): 89-92 |
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| 作者姓名： | 单凤兰 霍艳玲 罗浩斌 王煜明 |
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| 作者单位： | 吉林大学 |
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| 摘 要： | 采用Ｘ射线衍射（ＸＲＤ）、透射电子显微镜（ＴＥＭ）和电阻－温度曲线等方法研究了近等原子的富ＴｉＴｉＮｉ合金薄膜的析出相和相变等特征，并对结果进行了详细讨论。
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| 关 键 词： | 溅射 TiNi形状记忆合金 薄膜 |
Sputtered Thin Films of TiRich TiNi Shape Memory Alloy |
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| Shan Fenglan,Huo Yanling,Luo Haobin,Wang Yuming. Sputtered Thin Films of TiRich TiNi Shape Memory Alloy[J]. Rare Metal Materials and Engineering, 1999, 28(2): 89-92 |
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| Authors: | Shan Fenglan Huo Yanling Luo Haobin Wang Yuming |
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| Abstract: | Some features of precipitated phases and phase transformation in thin films of the Tirich TiNi alloy have been using Xray diffraction,transmission microscopy and resistance transition method. The results are discussed in detail. |
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| Keywords: | precipiated phase phase transformation sputter TiNi shape memory alloy |
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