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基于GaAs/AlGaAs量子阱材料的光致折射率分析
引用本文:李龙志,杨建义,王明华,江晓清.基于GaAs/AlGaAs量子阱材料的光致折射率分析[J].光学仪器,2005,27(5):136-140.
作者姓名:李龙志  杨建义  王明华  江晓清
作者单位:浙江大学信息与电子工程系,浙江,杭州,310027
基金项目:国家自然科学基金资助项目(60477018),国家自然科学基金重点资助项目(60436020)
摘    要:初步分析了基于GaAs/AlGaAs量子阱材料的光致折射率变化规律,利用自洽方法计算了光生载流子浓度对传输光的折射率改变量。当805nm的控制光注入强度为6×103W/cm2(8×103W/cm2)时,在垂直材料表面内1μm深度处,对1.55μm(1.31μm)的传输光可以达到-1-0 2的折射率变化量级。与GaAs体材料相比,量子阱材料所需控制光强度能够减少约20%,有助于降低全光开关与全光调制器的功耗。

关 键 词:集成光学  全光开关  光致折射率  量子阱材料
文章编号:1005-5630(2005)05-0136-05
收稿时间:2005/7/30
修稿时间:2005年7月30日

Analysis of photon-induced refractive index change based on GaAs/AlGaAs quantum wells materials
LI Long-zhi,YANG Jian-yi,WANG Ming-hu,JIANG Xiao-qing.Analysis of photon-induced refractive index change based on GaAs/AlGaAs quantum wells materials[J].Optical Instruments,2005,27(5):136-140.
Authors:LI Long-zhi  YANG Jian-yi  WANG Ming-hu  JIANG Xiao-qing
Abstract:The primary analysis of photon-induced refractive index change based on GaAs/AlGaAs quantum wells materials is presented in this paper.The effect of photon-excited carriers were treated self-consistently.For transmitting light at 1.55μm(1.3μm),Δn can reach-10~(-2) at 1μm depth along z axes when the power density of controlling light(805nm) is 6×10~3W/cm~2(8×10~3W/cm~2).Compared with the model based on GaAs bulk materials,the model based on quantum wells materials can reduce the controlling power density by about 20% to reach the same photon-induced refractive index change,and also decrease the controlling power consumption for all-optical switches and all-optical modulators.
Keywords:integrated optics  all optical switches  photon-induced refractive index  quantum wells materials
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