| 电子束曝光机激光工件台系统研制 |
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| 引用本文： | 乔俊仙,王肇志,胡松,张正荣,邢薇,唐小萍,王淑蓉. 电子束曝光机激光工件台系统研制[J]. 微纳电子技术, 2006, 43(2): 102-106 |
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| 作者姓名： | 乔俊仙 王肇志 胡松 张正荣 邢薇 唐小萍 王淑蓉 |
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| 作者单位： | 1. 中国科学院光电技术研究所,成都,610209;中国科学院研究生院,北京,100039
2. 中国科学院光电技术研究所,成都,610209 |
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| 摘 要： | 介绍了nm级电子束曝光机激光定位精密工件台系统的结构组成、各部分技术措施及总体性能指标。该工件台采用HP5527激光干涉测量系统,测量分辨率达0.6nm,结构上成功将导向与承载分离,对承片台、机械手等进行重大创新。无论是整机性能还是关键技术单元均处于国内领先水平,是一台性能优良、高精度的电子束曝光机工件台。
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| 关 键 词： | 电子束曝光机 激光干涉仪 工件台 精密定位 |
| 文章编号： | 1671-4776(2006)02-0102-05 |
| 收稿时间： | 2005-09-08 |
| 修稿时间： | 2005-09-08 |
Laser Stage System for E-Beam Lithography Machine |
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| QIAO Jun-xian,WANG Zhao-zhi,HU Song,ZHANG Zheng-rong,XING Wei,TANG Xiao-ping,WANG Shu-rong. Laser Stage System for E-Beam Lithography Machine[J]. Micronanoelectronic Technology, 2006, 43(2): 102-106 |
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| Authors: | QIAO Jun-xian WANG Zhao-zhi HU Song ZHANG Zheng-rong XING Wei TANG Xiao-ping WANG Shu-rong |
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| Affiliation: | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; 2.Graduate School of the Chinese Academy of Sciences, Beijing 100039, China |
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| Abstract: | The configuration,technology solutions and all performances of laser stage system for E-beam lithography machine were described. The HP 5527 laser measurement system which achieved a resolution of 0.6 nm was used for the stage. The vertical load of the stage and the oriented function of the guides were successfully separated. The wafer stage and manipulator were designed innovatively. The performances for both of them and the pivotal technical units are leading-edge at home. Its a high-precision stage which has excellent performance for E-beam lithography machine. |
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| Keywords: | E-beam lithography machine laser interferometer stage precision positioning |
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