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工艺变化下互连线分布参数随机建模与延迟分析
引用本文:张瑛,JANET M. Wang. 工艺变化下互连线分布参数随机建模与延迟分析[J]. 电路与系统学报, 2009, 14(4)
作者姓名:张瑛  JANET M. Wang
作者单位:1. 南京邮电大学,电子科学与工程学院,江苏,南京,210046
2. 亚利桑那大学电子工程系,亚利桑那州,AZ8742,美国
摘    要:随着超大规模集成电路制造进入深亚微米和超深亚微米阶段,电路制造过程中的工艺变化已经成为影响集成电路互连线传输性能的重要因素.文中引入高斯白噪声建立了互连线分布参数的随机模型,并提出基于Elmore延迟度量的工艺变化下的互连延迟估计式;通过简化工艺变化量与互连线参数之间的关系式,对延迟一阶变化量与二阶变化量进行了分析,给出一般工艺变化下互连延迟的统计特性计算方法;另,针对线宽工艺变化推导出互连延迟均值与方差的计算公式.最后通过仿真实验对工艺变化下互连线延迟分析方法及其统计特性计算公式的有效性进行了验证.

关 键 词:工艺变化  互连线  RC模型  Elmore延迟  蒙特卡洛法

Stochastic modeling of distributed parameters and analysis of interconnect delay in the presence of process variations
ZHANG Ying,JANET M.Wang. Stochastic modeling of distributed parameters and analysis of interconnect delay in the presence of process variations[J]. Journal of Circuits and Systems, 2009, 14(4)
Authors:ZHANG Ying  JANET M.Wang
Affiliation:ZHANG Ying1,JANET M.Wang2(1.College of Electronics science , Engineering,Nanjing University of Posts , Telecommunications,Nanjing 210046,China,2.Dep.of Electrical , Computer Engineering,College of Engineering , Mines,the University of Arizona,Arizona AZ8742,USA)
Abstract:With very large scale integrated circuits manufacturing entering the deep-sub-micron and super deep-sub-micron scale,process variations during circuit manufacturing have become an important factor which affects the transmission performance of interconnects in the integrated circuits.With the introduction of Gauss white noise this paper proposes the stochastic model of distributed parameters,and the interconnect delay formula affected by process variations is presented,which is based on Elmore delay.By simpl...
Keywords:process variations  interconnects  RC model  Elmore delay  Monte Carlo method  
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