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MOS电阻阵的非均匀性测量及补偿方法研究
引用本文:张凯,黄勇,孙力,阎杰. MOS电阻阵的非均匀性测量及补偿方法研究[J]. 西北工业大学学报, 2007, 25(1): 108-112
作者姓名:张凯  黄勇  孙力  阎杰
作者单位:西北工业大学,航天学院,陕西,西安,710072
摘    要:红外MOS电阻阵列是现代红外成像仿真系统中的关键元件。由于MOS电阻阵具有较强的热非均匀性,因此在进行红外仿真时必须对其进行实时补偿。文中对基于MOS电阻阵的关键技术——MOS电阻阵帧元非均匀性补偿技术进行深入探讨和研究,并提出了相应的解决方案:通过离线测试,实测得到每一帧元的电压温度特性曲线,建立电压温度补偿数据表格,使得驱动MOS热电阻面阵的灰度数据与表格数据相匹配,从而实现对MOS电阻阵的修正。实验证明,文中提出的方法能够很好地解决对MOS电阻阵非均匀特性进行补偿的问题,并已在基于MOS电阻阵的红外场景生成器中应用,取得了满意的效果。

关 键 词:MOS电阻阵  非均匀性补偿  红外场景生成器
文章编号:1000-2758(2007)01-0108-05
修稿时间:2006-05-11

Nonuniformity Characterization and Correction of MOS Resistor Array
Zhang Kai,Huang Yong,Sun Li,Yan Jie. Nonuniformity Characterization and Correction of MOS Resistor Array[J]. Journal of Northwestern Polytechnical University, 2007, 25(1): 108-112
Authors:Zhang Kai  Huang Yong  Sun Li  Yan Jie
Abstract:In the full paper,we explain in detail our research results on nonuniformity characterization and correction of MOS resistor array;in this abstract ,we just add some pertinent remarks to the two topics of explanation:(1)the causes and characteristics of nonuniformity of infrared images of MOS resistor array and(2)the nonuniformity measurement and compensation algorithm of MOS resistor array;in topic 1,we find that the main causes of the nonuniformity are the nonlinearity of the resistor array and the nonuniformity of background voltage;in topic 2,we measure voltage vs temperature curves by testing MOS resistor array offline and then establish their compensation table(Table 1 in the full paper),whereby each resistor in MOS resistor array can be corrected in real-time so that its gray degree can match the corresponding datum in Table1;also in topic 2,we generate the voltage vs temperature curve for each resistor in the array(a typical curve is shown in Fig 4 in the full paper).Our approach was adopted in a real IR scene projector based on MOS resistor array and the user expresssed satisfaction.
Keywords:MOS resistor array  nonuniformity correction  infrared scene projector
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