A non-fluorine mold release agent for Ni stamp in nanoimprint process |
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Authors: | Tien-Li Chang Jung-Chang Wang Ya-Wei Lee |
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Affiliation: | a Mechanical and Systems Research Laboratories, Industrial Technology Research Institute, Rm. 125, Building 22, 195 Section 4, Chung Hsing Road, Chutung, Hsinchu 310, Taiwan, ROC b Department of Manufacturing Research and Development, ADDA Corporation, Taiwan c National Nano Device Laboratories, Taiwan d Research and Development Division, Ordnance Readiness Development Center, Taiwan |
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Abstract: | This study presents a novel material as an anti-adhesive layer between Ni mold stamps and polymethyl methacrylate (PMMA) substrate in nanoimprint process. A polybenzoxazine ((6,6’-bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule self-assembled monolayer (PBO-SAM) considering as anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can be improve the nanoimprint process in Ni/PMMA substrates. In this work, the nanostructure-based Ni stamps and the imprinted PMMA mold are performed by electron-beam lithograph (EBL) and our homemade nanoimprint equipment, respectively. To control the forming of fabricated nanopatterns, the simulation can be analyzed their effect of temperature distributions on the deformation of PBO-SAM/PMMA substrate during hot embossing lithography (HEL) process. Herein the diameter of pillar patterns is 200 nm with and 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this conforming condition, the results of Ni mold stamps infer over 90% improvement in controlling quality and quantity. |
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Keywords: | Anti-adhesive layer Nano imprint Ni stamp PBO-SAM Non-fluoride coatings |
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