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Preparation of self-supporting boron targets
Authors:Y. Sasamoto   T. Kawabata   M. Hamagaki   I. Sugai  Y. Takeda
Affiliation:aCenter for Nuclear Study, Graduate School of Science, University of Tokyo, RIKEN Campus, 2-1 Hirosawa, Wako, 351-0198 Saitama, Japan;bDiscovery Research Institute, RIKEN (The Institute of Physical and Chemical Research), 2-1 Hirosawa, Wako, 351-0198 Saitama, Japan;cKEK, High Energy Accelerator Research Organization, Tsukuba, 305-0801 Ibaraki, Japan
Abstract:The procedure for the fabrication of self-supporting isotopically enriched 11B targets for the application to nuclear scattering measurements using an electron-beam-excited plasma (EBEP) method was described. A boron target layer of thickness 100±10 μg/cm2 was obtained. The thickness and uniformity of the prepared 11B film were determined by measuring the energy loss of alpha particles across the target area. The purity of the target was examined, and it was found that the investigated boron film contained about 10% impurities.
Keywords:Self-supporting boron target   Electron-beam-excited plasma
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