沉积电压对电泳沉积成膜均匀性的影响

沉积电压是电泳沉积工艺的重要参数之一。为研究其对电泳沉积成膜均匀性的影响,对带电粒子的电泳过程进行理论分析,并结合COMSOL多物理场接口,得出电泳过程的仿真图。结果显示:施加电压增大,流场流速增加,但电极间形成的流场相对均匀,膜层的均匀性也较好。沉积电压不高于100 V时,极间形成的均匀流场并不影响粒子均匀沉积;电压高于100 V时,极间形成的明显不均匀流场会影响粒子的运动与沉积,从而降低了膜层的均匀性。

Influence of Deposition Voltage on Uniformity of Film Formation by Electrophoretic Deposition

In order to study the influence of deposition voltage on the uniformity of film formation by electrophoretic deposition,the electrophoretic process of charged particles was theoretically analyzed.Moreover,combined with COMSOL multiphysics interface,the simulation figures of electrophoretic process were derived.Results showed that greater voltage caused higher velocity of the flow field,while the flow field was relatively uniform between the electrodes and the uniformity of film was better.When the deposition voltage was not higher than 100 V,the uniform flow field formed between the electrodes had no effect on the homogeneous deposition of particles.When the voltage exceeded 100 V,the obvious non-uniform flow field formed between the electrodes would affect the motion and deposition of particles,which resulted in the reduction of the uniformity of films.