Y2O3:Eu电致发光膜的制备与结构表征

采用电子束蒸发和射频磁控溅射技术沉积了Y2 O3 :Eu电致发光薄膜 ,对膜进行了不同温度的大气热处理。用原子力显微镜 (AFM)观察了Y2 O3 :Eu膜的表面形貌 ,用X射线 (XRD)分析了Y2 O3 :Eu膜的结构 ,并对两种Y2 O3 :Eu膜的微结构和表面形貌进行了比较。结果表明 ,射频磁控溅射Y2 O3 :Eu膜与电子束蒸发Y2 O3 :Eu膜相比 ,结构更致密 ,表面更平滑 ,而且 ,在 90 0°C高温热处理后 ,溅射膜呈现单斜晶系结构 ,具有该结构的Y2 O3 :Eu膜适宜于作电致发光膜。

Preparation and Structure Characterization of Y2O3:Eu Electroluminescent Phosphor Thin Film

Y 2O 3:Eu electroluminescent phosphor thin films were deposited with electron beam evaporation and rf-magnetron sputtering techniques. The samples deposited were post-annealed in atmosphere at different temperature. The surface morphology of Y 2O 3:Eu films was examined by Atomic Force Microscopy (AFM). The structures of Y 2O 3:Eu films were ananlyzed by X-Ray Diffraction (XRD). And the microstructure and surface morphology of rf-magnetron sputtered Y 2O 3:Eu films and electron beam evaporated Y 2O 3:Eu films were compared. Results show that, for rf-magnetron sputtered Y 2O 3:Eu films, the surface is smoother and the structure is denser compared to electron beam evaporated films. Moreover after 900 °C heat treatment monoclinic system appears in sputtered Y 2O 3:Eu films. Sputtered Y 2O 3:Eu films having this structure are more suitable for electroluminescent phosphor thin films than evaporated films which are predominantly cubic structure.