Minority carrier diffusion length in LPE InxGa1−xP: N layers (x < 0.01) |
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Authors: | H. Haefner G. Oelgart J. Kaniewski B. Mroziewicz |
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Affiliation: | Humboldt Universität Berlin, Sektion Physik, 1040 Berlin, Invalidenstr. 42, East Germany;Institute of Electron Technology, 02-668 Warsaw, Al. Lotników 32/46, Poland |
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Abstract: | Minority carrier diffusion length InxGa1?xP LPE layers has been measured using the electron beam method. It has been found that this parameter significantly changes with the composition of the alloy. The measured relationship proves that minority carrier mobility in InxGa1?xP alloys with low indium content strongly depends on the alloy composition. It is suggested that alloy scattering may be responsible for this behaviour. The effect of doping the InxGa1?xP LPE layers with nitrogen has also been investigated. Results indicate that carrier mobility drops when the nitrogen concentration exceeds certain limits and this most probably can be ascribed to carrier scattering on the nitrogen centers. |
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