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| 基底温度和氧分压对直流磁控溅射制备的ZnO：Al薄膜性能的影响 | |
| 摘 要： | |
| 关 键 词： | ZAO薄膜 氧分压 直流磁控溅射 电阻率 透过率 |
| 文章编号： | 1002-0322（2006）06-0011-04 |
| 收稿时间： | 2006-02-12 |
| 修稿时间： | 2006-02-12 |
Effects of substrate temperature and oxygen partial pressure on ZAO Film by DC magnetron sputtering |
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| Abstract: | |
| Keywords: | ZAO film oxygen partial pressure DC magnetron sputtering electrical resistivity optical transmittance |