Growth and microstructure of Ba β-alumina films by laser chemical vapor deposition |
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Authors: | Akihiko Ito Yu You Hirokazu Katsui Takashi Goto |
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Affiliation: | Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan |
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Abstract: | Ba β-alumina films were prepared by laser chemical vapor deposition. Mostly single-phase Ba β-alumina films were obtained at 1125–1200 K and for an Al/Ba molar ratio of 12.4–16.6. BaAl2O4 and α-Al2O3 were codeposited with Ba β-alumina under Ba- and Al-rich conditions, respectively. The Ba β-alumina films consisted of hexagonal grains, and the (1 1 0)-oriented Ba β-alumina films had a fin-like columnar structure. The highest deposition rate reached 120 μm h?1 at around 1200 K. A thin layer of Ba-rich superstructure was formed on the surface of the (1 1 0)-oriented columnar grains. |
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Keywords: | Ba β-alumina Laser CVD Oriented growth Microstructure |
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