| 有机硅低聚体合成工艺 |
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| 引用本文： | 杨锐,曹端林,李永祥. 有机硅低聚体合成工艺[J]. 应用化工, 2006, 35(12): 943-945 |
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| 作者姓名： | 杨锐 曹端林 李永祥 |
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| 作者单位： | 中北大学,化工与环境学院,山西,太原,030051 |
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| 摘 要： | 采用一甲基三乙氧基硅烷、二甲基二乙氧基硅烷、一苯基三乙氧基硅烷未完全水解制备了含乙氧基的有机硅低聚体。通过正交实验分析确定最佳工艺条件为,原料配比R/S i=1.4,Ph/R=0.2,反应时间为2.5 h,反应温度为80℃。对最佳工艺条件下的有机硅低聚体进行红外光谱表征,低聚体剪切强度可达2.92 MPa。
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| 关 键 词： | 一甲基三乙氧基硅烷 二甲基二乙氧基硅烷 一苯基三乙氧基硅烷 合成 |
| 文章编号： | 1671-3206(2006)12-0943-03 |
| 收稿时间： | 2006-08-24 |
| 修稿时间： | 2006-08-24 |
Synthetic craft of organosilyl low-molecular polymer |
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| YANG Rui,CAO Duan-lin,LI Yong-xiang. Synthetic craft of organosilyl low-molecular polymer[J]. Applied chemical industry, 2006, 35(12): 943-945 |
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| Authors: | YANG Rui CAO Duan-lin LI Yong-xiang |
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| Affiliation: | Chemical Industry and Environment Institute of North University of China,Taiyuan 030051, China |
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| Abstract: | Organosilyl low-molecular polymer was synthesized by methltriethoxysilone,diethoxydimethlsilane,phenyltriethoxysilane.The process was optimized by orthogonal experiment and a better synthetic condition was obtained.The results showed that react 2.5 h at 80℃ and the materials ratio is R/Si=1.4,Ph/R=0.2.The polymer performed well prepared under the optimum condition,the product was characterized by IR,and the shear strength can reach 2.92 MPa. |
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| Keywords: | methltriethoxysilone diethoxydimethlsilane phenyltriethoxysilane synthetic |
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